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자료 필터
자료유형
발행연도
2002 ~ 2026
2002 2026
키워드
언어
전체 392건 중 1번부터 10번까지의 결과를 표시합니다.
2026
Article
Area-selective atomic layer deposition of ruthenium using O2 plasma-enhanced self-assembled monolayers
- Na, Young Seo ;
- Im, Yehbeen ;
- Lim, Hyunjin ;
- Kim, Donguk ;
- Seo, Kangbaek ;
- ... Choi, Changhwan ;
- 외 1명
- 2026-11
- Applied Surface Science
- ELSEVIER
Article
Plasma-thermal atomic layer etching of molybdenum using CF4 surface fluorination and Ar plasma removal
- Kim, Donguk ;
- Na, Young Seo ;
- Im, Yehbeen ;
- Seo, Kangbaek ;
- Lee, Seungchae ;
- ... Choi, Changhwan
- 2026-11
- Applied Surface Science
- ELSEVIER
Article
Plasma dry desmear of Ajinomoto build-up film for fine micro-via fabrication in advanced semiconductor packaging
- Kim, Gyulee ;
- Kim, Sunbum ;
- Min, Kyoung Yeon ;
- Han, Young Ju ;
- Jeong, Soonoh ;
- ... Choi, Changhwan ;
- 외 1명
- 2026-11
- Materials Science in Semiconductor Processing
- Pergamon Press
Article
Effective Dipole Strength Modulation Using Imprinted Gadolinium Dipole (IGD) Layer to Achieve Fine Vt Tunability for Low Thermal Budget CFET Devices
- Han, Sangkuk ;
- Choi, Wonjae ;
- Chung, Jaewon ;
- Jang, Haesoo ;
- Park, Kyungwook ;
- ... Ahn, Jinho ;
- ... Choi, Changhwan ;
- 외 5명
- 2026-07
- Digest of Technical Papers - Symposium on VLSI Technology
- Institute of Electrical and Electronics Engineers Inc.
Article
Demonstration of 3D-Extendible, Logic-Compatible Sub-1.8 v Asymmetric Double-Gate FeFETs with Sub-3.5 nm Ultrathin HZO for Analog CIM
- Park, Kyungsoo ;
- Jeong, Hyeoncheol ;
- Choi, Jihoon ;
- Kim, Taesuk ;
- Choi, Yeonwoo ;
- ... Ahn, Jinho ;
- ... Choi, Changhwan ;
- 외 3명
- 2026-05
- 2026 IEEE International Memory Workshop, IMW 2026 - Proceedings
- Institute of Electrical and Electronics Engineers Inc.
Article
Material and Electrical Characteristics of a Thin-Film Transistor Using Cationic Composition-Controlled Atomic Layer-Deposited In–Ga–Sn–O (IGTO) Thin Film
- Lee, Chanseul ;
- Kim, Sunbum ;
- Min, Kyoung Yeon ;
- Kim, Gyulee ;
- Kim, Minhyuk ;
- ... Choi, Changhwan ;
- 외 1명
- 2026-02
- ACS APPLIED ELECTRONIC MATERIALS
- AMER CHEMICAL SOC
Article
Analysis on the Adhesion Failure between Cu Metal Layer and Photosensitive Polyimide (PSPI) for 2.nD Re-Distribution Layer (RDL) Process
- Kim, Subum ;
- Han, Dugkyu ;
- Min, Kyungyeon ;
- Choi, Changhwan
- 2026-01
- Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
2025
Conference
Multi-Threshold Voltage(Vth) Engineering Using ALD TaN-Based HKMG Gate Stack for Advanced Logic ang DRAM Devices
- 2025-11-13
Conference
Gate Metal Engineering for Tailoring Ferroelectric Properties of Hf(x)Zr(1-x)O2 Thin Films
- 2025-11-11
Article
The effects of inserted layers (HfO2, ZrO2, Y2O3, La2O3) on the ferroelectric and synaptic properties of Zr-doped HfO2 sandwich structure
- Chung, Chulwon ;
- Park, Kyungsoo ;
- Yun, Seunghyeon ;
- Park, Junhyeok ;
- Jeong, Hyeon Cheol ;
- ... Choi, Changhwan
- 2025-11
- Applied Surface Science
- ELSEVIER
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