A New Fabrication of ZnO/Al2O3 Nanocables by Using Atomic Layer Deposition

초록

We have been studied the fabrication of nanocables by using atomic layer deposition (ALD) with a nanoporous membrane as a template. The Al2O3 thin films were formed inside the polycarbonate (PC) template or anodic aluminum oxide (AAO) by using atomic layer deposition (ALD) from trimethylaluminum (TMA) and H2O at 405K. Due to the excellent coatings of the ALD process, the wall thickness of the oxide nanotubes and thus the inner diameter of the tubes could be controlled. The ZnO nanowires were deposited by using atomic layer deposition (ALD) into Al2O3 nanotubes. The ZnO/Al2O3 nanocables have been investigated by scanning electron microscopy (SEM) and transmission electron microscopy (TEM).