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The Effects of Plasma Atomic Layer Deposited TiN on MOS device: deposition temperature,capping and post annealing
- 제목
- The Effects of Plasma Atomic Layer Deposited TiN on MOS device: deposition temperature,capping and post annealing
- 저자
- 최창환
- 발행일
- 2011-07-05
- 학회명
- The Third International Conference on Microelectronics and Plasma Technology
- 개최지
- Dalian (대련), China (중국)