Dynamic band alignment modulation of ultrathin WOx/ZnO stack for high on/off ratio field-effect switching applications

  • Lee, Ho-In; 
  • Park, Jinseon; 
  • Kim, Yun Ji; 
  • Heo, Sunwoo; 
  • Hwang, Jeongwoon; 
  • ... Sung, Myung Mo; 
  • 외 4명
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초록

A two-dimensional (2D) WOx/ZnO stack reveals a unique carrier transport behavior, which can be utilized as a novel device element to achieve a very high on/off ratio (>10(6)) and an off current density lower than 1 nA cm(-2). These unique behaviors are explained by a dynamic band alignment between WOx and ZnO, which can be actively modulated by a gate bias. The performance of FET utilizing the WOx/ZnO stack is comparable to those of other 2D heterojunction devices; however, it has a unique benefit in terms of process integration because of very low temperature process capability (T < 110 degrees C). The high on/off switching with extremely low off current density utilizing the dynamic band alignment modulation at the WOx/ZnO stack can be a very useful element for future device applications, especially in monolithic 3D integration or flexible electronics.

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GRAPHENE; TRANSISTORS; TRANSPORT; DIODES; MOS2; HETEROSTRUCTURES; PERFORMANCE; DEFECTS
제목
Dynamic band alignment modulation of ultrathin WOx/ZnO stack for high on/off ratio field-effect switching applications
저자
Lee, Ho-In; Park, Jinseon; Kim, Yun Ji; Heo, Sunwoo; Hwang, Jeongwoon; Kim, Seung-Mo; Lee, Yongsu; Cho, Kyeongjae; Sung, Myung Mo; Lee, Byoung Hun
DOI
10.1039/c9nr10988a
발행일
2020-08
유형
Article
저널명
Nanoscale
권
12
호
32
페이지
16755 ~ 16761