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Low-damage etching of poly-Si and SiO2 via a low-energy electron beam in inductively coupled CF4 plasma
- 제목
- Low-damage etching of poly-Si and SiO2 via a low-energy electron beam in inductively coupled CF4 plasma
- 저자
- 정진욱
- 발행일
- 2024-11-13
- 학회명
- Korean international semiconductor conference on manufacturing technology 2024
- 개최지
- Paradise Hotel Busan