상세 보기
자료 필터
자료유형
발행연도
2002 ~ 2026
2002 2026
키워드
언어
전체 720건 중 1번부터 10번까지의 결과를 표시합니다.
2026
Article
Electron energy distribution measurement in an inductively coupled plasma with a cryogenic temperature substrate
- Ahn, Jong-Ha ;
- Kim, Min-Seok ;
- Kim, Deok-Hwan ;
- Ha, Seok-Hyeon ;
- Chung, Chin-Wook
- 2026-09
- Plasma Sources Science and Technology
- IOP Publishing Ltd
Article
Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching (vol 35 , 035001 , 2026)
- Kim, Ju-Ho ;
- Jiang, Yi-Lang ;
- Jeong, Yeong Jae ;
- Kim, Jae-Hwi ;
- Chung, Chin-Wook
- 2026-08
- Plasma Sources Science and Technology
- IOP Publishing Ltd
Article
Noninvasive method for monitoring plasma parameters and dielectric thickness applicable to plasma processing
- Seo, Beom-Jun ;
- Jung, Jiwon ;
- Choi, Jae-Hoon ;
- Ahn, Se-Hun ;
- Kim, Nayeon ;
- ... Chung, Chin-Wook
- 2026-07
- Journal of Vacuum Science and Technology A
- A V S AMER INST PHYSICS
Article
Electron-kinetic reactor engineering for damage-free, high-selectivity plasma etching
- Kim, Min-Seok ;
- Yeo, Yujin ;
- Nahm, Hyeon Ho ;
- Chung, Chin-Wook
- 2026-04
- Chemical Engineering Journal
- ELSEVIER SCIENCE SA
Article
Investigation of the interactions of NF3-based plasma with Y2O3 and YF3 coatings: Focus on contamination particle generation and wall redeposition
- So, Jongho ;
- Jeong, Inseok ;
- Maeng, Seonjeong ;
- Choi, Eunmi ;
- Kim, Minjoong ;
- ... Chung, Chin-Wook ;
- 외 1명
- 2026-04
- Journal of the European Ceramic Society
- ELSEVIER SCI LTD
Conference
Anomalous Behavior of Plasma Characteristics in a Planar Helical Resonator Discharge
- 2026-03-06