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Effect of adding small amount of inductive fields to O-2, Ar/O-2 capacitively coupled plasmas
- Lee, Min-Hyong;
- Lee, Hyo-Chang;
- Chung, Chin-Wook
WEB OF SCIENCE
8SCOPUS
8초록
Electron energy distribution functions (EEDFs) of low pressure O-2 plasma were measured by adding small amount of coil power in a capacitive discharge. When the plasma was generated by bias power only, the measured EEDF showed a bi-Maxwellian distribution. However, when a very small coil power (a few Watts) was added, the EEDF evolved abruptly into a Maxwellian distribution, while the electron density was decreased. In an Ar/O-2 mixture discharge, this EEDF evolution to the Maxwellian was also observed at a relatively higher coil power. This abrupt change in EEDFs with a very small coil power appears to be attributed to a combined effect of collisionless heating by capacitive and induced electric fields.
키워드
- 제목
- Effect of adding small amount of inductive fields to O-2, Ar/O-2 capacitively coupled plasmas
- 저자
- Lee, Min-Hyong; Lee, Hyo-Chang; Chung, Chin-Wook
- 발행일
- 2012-05
- 유형
- Article
- 권
- 111
- 호
- 9
- 페이지
- 1 ~ 4