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UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature
- Lee, Byoung H.;
- Cho, Sangho;
- Hwang, Jae K.;
- Kim, Su H.;
- Sung, Myung M.
Citations
WEB OF SCIENCE
26Citations
SCOPUS
27초록
A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly (ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO2 thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO2 thin films with good adhesive strength on polymer substrates. The ZrO2 thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties.
키워드
Atomic layer deposition; ZrO2; Self-limiting reaction; UV-ALD; PET; THERMAL BARRIER COATINGS; GROWTH-KINETICS; TITANIUM-OXIDE; GAS-TRANSPORT; SILICON; SIO2; PHOTOIRRADIATION; PRECURSORS; EPITAXY; TIO2
- 제목
- UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature
- 저자
- Lee, Byoung H.; Cho, Sangho; Hwang, Jae K.; Kim, Su H.; Sung, Myung M.
- 발행일
- 2010-09
- 유형
- Article; Proceedings Paper
- 저널명
- Thin Solid Films
- 권
- 518
- 호
- 22
- 페이지
- 6432 ~ 6436