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Enhancement of photoresist etching by controlling the impedance between bias electrode and ground in an inductively coupled plasma
- 제목
- Enhancement of photoresist etching by controlling the impedance between bias electrode and ground in an inductively coupled plasma
- 저자
- 정진욱
- 발행일
- 2022-11-16
- 학회명
- Korean international semiconductor conference on manufacturing technology 2022
- 개최지
- 파라다이스 호텔(부산)