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Performance Improvement of the Gate-Last Si-based TFET with Atomic Layer Deposited HfAlOx Gate Dielectrics
- 제목
- Performance Improvement of the Gate-Last Si-based TFET with Atomic Layer Deposited HfAlOx Gate Dielectrics
- 저자
- 최창환
- 발행일
- 2016-07-05
- 학회명
- Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD)
- 개최지
- Hakodate, Japan