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Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching (vol 35 , 035001 , 2026)
CORRIGENDUM: Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching (2026 Plasma Sources Sci. Technol.35035001)
- Kim, Ju-Ho;
- Jiang, Yi-Lang;
- Jeong, Yeong Jae;
- Kim, Jae-Hwi;
- Chung, Chin-Wook
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In the original version of the article metadata, Acknowledgment contains an incorrect grant number RS-2023-00237362. The Grant Number should be revised into RS-2023-00237543. In addition, the following funding information should be added to the Acknowledgment: 2410003887, 1415187722, 00154752, 1415187459, and RS-2024-0043780. This correction includes both the revision of the incorrect grant number and the addition of previously omitted funding information. Therefore, the Acknowledgment should be revised as follows
- 제목
- Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching (vol 35 , 035001 , 2026)
- 제목 (타언어)
- CORRIGENDUM: Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching (2026 Plasma Sources Sci. Technol.35035001)
- 저자
- Kim, Ju-Ho; Jiang, Yi-Lang; Jeong, Yeong Jae; Kim, Jae-Hwi; Chung, Chin-Wook
- 발행일
- 2026-08
- 유형
- Correction
- 권
- 35
- 호
- 8
- 페이지
- 1 ~ 2
- 언어
- ENG
- 출판사
- IOP Publishing Ltd
- 발행국가
- 영국
- 분량
- 2 페이지
- ISSN
- E 1361-6595
P 0963-0252