Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching (vol 35 , 035001 , 2026)

CORRIGENDUM: Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching (2026 Plasma Sources Sci. Technol.35035001)
  • Kim, Ju-Ho; 
  • Jiang, Yi-Lang; 
  • Jeong, Yeong Jae; 
  • Kim, Jae-Hwi; 
  • Chung, Chin-Wook
Citations

WEB OF SCIENCE

0
Citations

SCOPUS

0

초록

In the original version of the article metadata, Acknowledgment contains an incorrect grant number RS-2023-00237362. The Grant Number should be revised into RS-2023-00237543. In addition, the following funding information should be added to the Acknowledgment: 2410003887, 1415187722, 00154752, 1415187459, and RS-2024-0043780. This correction includes both the revision of the incorrect grant number and the addition of previously omitted funding information. Therefore, the Acknowledgment should be revised as follows

제목
Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching (vol 35 , 035001 , 2026)
제목 (타언어)
CORRIGENDUM: Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching (2026 Plasma Sources Sci. Technol.35035001)
저자
Kim, Ju-Ho; Jiang, Yi-Lang; Jeong, Yeong Jae; Kim, Jae-Hwi; Chung, Chin-Wook
DOI
10.1088/1361-6595/ae9222
발행일
2026-08
유형
Correction
저널명
Plasma Sources Science and Technology
권
35
호
8
페이지
1 ~ 2