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Selective Generation of CF₂ Radicals in Ar/CF₄ Plasma with a DC-Biased Grid for High-Precision Atomic Layer Etching
- 제목
- Selective Generation of CF₂ Radicals in Ar/CF₄ Plasma with a DC-Biased Grid for High-Precision Atomic Layer Etching
- 저자
- 정진욱
- 발행일
- 2025-06-23
- 학회명
- ALD/ALE 2025
- 개최지
- International Convention Center Jeju (ICC Jeju), Jeju Island, South Korea