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The Effects of (NH4)Sx Treatment on n-GaN MOS Device with Nano-Laminated ALD HfAlOx and Ru Gate Stack
- 제목
- The Effects of (NH4)Sx Treatment on n-GaN MOS Device with Nano-Laminated ALD HfAlOx and Ru Gate Stack
- 저자
- 최창환
- 발행일
- 2015-06-30
- 학회명
- Insulating Films on Semiconductors (INFOS)
- 개최지
- Udine, Italy