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복합광원 기반의 광 소결법을 이용한 구리나노잉크 패턴의 전도성 향상에 관한 연구
Effective photonic sintering for highly conductive copper nano-ink film using flash white light combined with Deep UV and NIR light irradiation
- 황현준;
- 오경환;
- 김학성
초록
We developed an ultra-high speed photonic sintering method involving flash white light (FWL) combined with near infrared (NIR) and deep UV light irradiation to produce highly conductive copper nano-ink film. Flash white light irradiation energy and the power of NIR/deep UV were optimized to obtain high conductivity Cu films. Several microscopic and spectroscopic characterization techniques such as scanning electron microscopy (SEM) and a x-ray diffraction (XRD) were employed to characterize the Cu nano-films. Optimally sintered Cu nano-ink films produced using a deep UV-assisted flash white light sintering technique had the lowest resistivity (7.62 μΩ·cm), which was only 4.5-fold higher than that of bulk Cu film (1.68 μΩ•cm).
키워드
Cu nano-ink(구리 나노잉크); Sintering process(소결 공정); Flash white light(극단파 백색광); Near infrared(근 적외선); Deep ultraviolet(원 자외선)
- 제목
- 복합광원 기반의 광 소결법을 이용한 구리나노잉크 패턴의 전도성 향상에 관한 연구
- 제목 (타언어)
- Effective photonic sintering for highly conductive copper nano-ink film using flash white light combined with Deep UV and NIR light irradiation
- 저자
- 황현준; 오경환; 김학성
- 발행일
- 2015-11
- 유형
- Proceeding
- 저널명
- 대한기계학회 창립 70주년 기념 학술대회
- 페이지
- 571 ~ 575