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The Effects of Etch Chemicals on the Electrical Properties of Metal-Oxide-Semiconductor (MOS) Device with Plasma Enhanced Atomic Layer Deposited (PEALD) TiN Metal Electrode
- 제목
- The Effects of Etch Chemicals on the Electrical Properties of Metal-Oxide-Semiconductor (MOS) Device with Plasma Enhanced Atomic Layer Deposited (PEALD) TiN Metal Electrode
- 저자
- 최창환
- 발행일
- 2015-11-27
- 학회명
- 한국표면공학회 추계학술대회
- 개최지
- 곤지암리조트