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Real time feedback control of plasma density using a floating probe in semiconductor processing
- Jang, Sung-Ho;
- Oh, Se-Jin;
- Lee, Young-Kwang;
- Chung, Chin-Wook
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WEB OF SCIENCE
6Citations
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4초록
Real time feedback control of plasma density was developed and carried out in an inductively coupled plasma. This control method uses a floating probe as a sensor because it can measure plasma density in real time without modification of the plasma reactors and it does not perturb the plasma. The results show that through feedback control, plasma density can be maintained constant within a steady state error of less than 0.3% even if there is a sudden pressure disturbance. This feedback control method is expected to improve the repeatability and reliability of plasma reactors.
키워드
Plasma; Semiconductor processing; PID control; Feedback; Inductively coupled plasma; Feedback; Inductively coupled plasma; Plasma density; Plasmas; Probes; Three term control systems; Feedback control; Control methods; Feedback control methods; Plasma reactors; Pressure disturbance; Real time; Real-time feedback; Semiconductor processing; Steady state errors
- 제목
- Real time feedback control of plasma density using a floating probe in semiconductor processing
- 저자
- Jang, Sung-Ho; Oh, Se-Jin; Lee, Young-Kwang; Chung, Chin-Wook
- 발행일
- 2013-01
- 유형
- Article
- 권
- 13
- 호
- 1
- 페이지
- 76 ~ 79