Real time feedback control of plasma density using a floating probe in semiconductor processing

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4

초록

Real time feedback control of plasma density was developed and carried out in an inductively coupled plasma. This control method uses a floating probe as a sensor because it can measure plasma density in real time without modification of the plasma reactors and it does not perturb the plasma. The results show that through feedback control, plasma density can be maintained constant within a steady state error of less than 0.3% even if there is a sudden pressure disturbance. This feedback control method is expected to improve the repeatability and reliability of plasma reactors.

키워드

PlasmaSemiconductor processingPID controlFeedbackInductively coupled plasmaFeedbackInductively coupled plasmaPlasma densityPlasmasProbesThree term control systemsFeedback controlControl methodsFeedback control methodsPlasma reactorsPressure disturbanceReal timeReal-time feedbackSemiconductor processingSteady state errors
제목
Real time feedback control of plasma density using a floating probe in semiconductor processing
저자
Jang, Sung-HoOh, Se-JinLee, Young-KwangChung, Chin-Wook
DOI
10.1016/j.cap.2012.06.012
발행일
2013-01
유형
Article
저널명
Current Applied Physics
13
1
페이지
76 ~ 79