상세 보기
The Effects of NF3/NH3 Remote Plasma Dry Cleaning on the Electrical Characteristics of MOS Device on the Highly Trenched Si Substrate
- 제목
- The Effects of NF3/NH3 Remote Plasma Dry Cleaning on the Electrical Characteristics of MOS Device on the Highly Trenched Si Substrate
- 저자
- 최창환
- 발행일
- 2018-08-23
- 학회명
- IUMRS-ICEM 2018
- 개최지
- DCC, Daejeon, Korea