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Influence of Oxygen Profile in ALD HfO2-x Thin Films on Non-Volatile Resistive Switching Behaviors with a Ti/HfOx/Pt Structure
- 제목
- Influence of Oxygen Profile in ALD HfO2-x Thin Films on Non-Volatile Resistive Switching Behaviors with a Ti/HfOx/Pt Structure
- 저자
- 최창환
- 발행일
- 2017-07-03
- 학회명
- Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Device (AWAD)
- 개최지
- Gyeongju, Korea