Enhanced Plasma Uniformity in RF Plasma With Side Multihole

Lee, Hyo-Chang; Chung, Chin-Wook

doi:10.1109/TPS.2014.2331680

상세 보기

Enhanced Plasma Uniformity in RF Plasma With Side Multihole

Lee, Hyo-Chang;
Chung, Chin-Wook

Citations

WEB OF SCIENCE

4

Citations

SCOPUS

4

초록

Capacitively coupled plasma source with side multihole is studied. Due to the hollow cathode effect at the multihole, edge plasma density is strongly increased and thus, plasma uniformity is significantly enhanced.

키워드

Capacitively coupled plasma (CCP); hollow cathode; plasma uniformity; radio-frequency (RF) gas discharge; DISCHARGES

제목: Enhanced Plasma Uniformity in RF Plasma With Side Multihole

저자: Lee, Hyo-Chang; Chung, Chin-Wook

DOI: 10.1109/TPS.2014.2331680

발행일: 2014-10

유형: Article

저널명: IEEE Transactions on Plasma Science

권: 42

호: 10

페이지: 2766 ~ 2767