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Real time dose monitoring system by sensing implanter current and biased pulse voltage in plasma source ion implantation
- 제목
- Real time dose monitoring system by sensing implanter current and biased pulse voltage in plasma source ion implantation
- 저자
- 정진욱
- 발행일
- 2011-07-06
- 학회명
- the third international conference on microelectronics and plasma technology
- 개최지
- dalian, china