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Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas
- Kim, Young-Cheol;
- Lee, Hyo-Chang;
- Chung, Chin-Wook
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2초록
In this paper, 2-D plasma density profile is measured in an inductively coupled plasma (ICP) with changing rf power and gas pressure. As the ICP power increases at a fixed argon gas pressure of 100 mtorr, increase in the plasma density is observed at the radial edge. It could be understood by the neutral gas depletion in the discharge center and the step-ionization effect.
키워드
ICP; neutral gas depletion; plasma uniformity; Argon; Electric discharges; Ionization of gases; Plasma density; Inductively coupled plasma; 2-D measurements; Argon gas pressure; Density profile; ICP; Inductively coupled plasma (ICP); Ionization effect; Neutral gas; Plasma uniformity
- 제목
- Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas
- 저자
- Kim, Young-Cheol; Lee, Hyo-Chang; Chung, Chin-Wook
- 발행일
- 2014-10
- 유형
- Article
- 권
- 42
- 호
- 10
- 페이지
- 2858 ~ 2859