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The Effect of O2 Plasma Etching Process to Remove Residue on the Trench Patterned Structures
- 제목
- The Effect of O2 Plasma Etching Process to Remove Residue on the Trench Patterned Structures
- 저자
- 최창환
- 발행일
- 2017-08-31
- 학회명
- International Union of Material Research Society-International Conference of Advanced Materials (IUMRS-ICAM)
- 개최지
- Kyoto, Japan