Research of non-uniformity in 450 mm multi-electrode capacitive coupled plasma

초록

To enable the industrial application of large-area capacitive coupled plasma (CCP), we studied non-uniformity of CCP with a 450 mm electrode. The field difference is one factor that reduces plasma uniformity. This effect is increased when the electrode's area is enlarged; therefore, we designed a multi-electrode CCP to overcome this problem. We found the optimal power conditions for each electrode to provide the best uniformity. Then, we powered on only one electrode to determine the property of each electrode. Our experiments showed some diffusion issues, and these results matched the results of the previous uniformity experiments.

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