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The Effects of Process Temperature on the Work Function Modulation of ALD HfO2 MOS Device with Plasma Enhanced ALD TiN Metal Gate Using TDMAT Precursor Development
- 제목
- The Effects of Process Temperature on the Work Function Modulation of ALD HfO2 MOS Device with Plasma Enhanced ALD TiN Metal Gate Using TDMAT Precursor Development
- 저자
- 최창환
- 발행일
- 2017-06-28
- 학회명
- Conference on Insulating Films on Semiconductors (INFOS)
- 개최지
- 포츠담, 독일