Thermal decomposition of perfluorodecylsiloxane self-assembled monolayers in air

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초록

The thermal decomposition of perfluorodecylsiloxane self-assembled monolayers (SAMs) in air has been studied using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and contact angle analysis. It is found that the monolayers are stable in air up to about 300 degrees C. Above 350 degrees C the monolayers primarily decompose through C-C bond cleavage, with a gradual reduction in chain length.

키워드

perfluorodecylsiloxanemonolayerOXIDIZED SI(100) SURFACEFEATURESBEHAVIORGOLD
제목
Thermal decomposition of perfluorodecylsiloxane self-assembled monolayers in air
저자
Seo, Eun K.Sung, Myung Mo
DOI
10.1016/j.ultramic.2007.02.037
발행일
2007-10
유형
Article; Proceedings Paper
저널명
Ultramicroscopy
107
10-11
페이지
995 ~ 999