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Study on SiO₂ Atomic Scale Etching Using Selective Control of Ar Metastable Atom Generation
- 제목
- Study on SiO₂ Atomic Scale Etching Using Selective Control of Ar Metastable Atom Generation
- 저자
- 정진욱
- 발행일
- 2025-11-12
- 학회명
- Korean international semiconductor conference on manufacturing technology 2025
- 개최지
- Paradise Hotel Busan, Busan, Republic of Korea