ScholarWorks@한양대학교

상세 보기

Si etch characteristics in an ultra-low electron temperature CF4 plasma​

제목
Si etch characteristics in an ultra-low electron temperature CF4 plasma​
저자
정진욱
발행일
2024-11-07
학회명
70th American Vacuum Society
개최지
Tampa Convention center

ScholarWorks@한양대학교

(04763) 서울특별시 성동구 왕십리로 222 Tel. +82-2-2220-1370 +82-2-2220-1366

COPYRIGHT © 한양대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.