상세 보기
The effect of electron and ion beam on Si etching generated in a low pressure inductively coupled plasma with a DC-biased Grids
- 제목
- The effect of electron and ion beam on Si etching generated in a low pressure inductively coupled plasma with a DC-biased Grids
- 저자
- 정진욱
- 발행일
- 2025-02-26
- 학회명
- SPIE Advanced Lithography + Patterning 2025
- 개최지
- San Jose, California, US