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Characterization of an inductively coupled plasma(ICP) source for ion implantation process
- 제목
- Characterization of an inductively coupled plasma(ICP) source for ion implantation process
- 저자
- 정진욱
- 발행일
- 2019-10-28
- 학회명
- The 72nd Annual Gaseous Electronics Conference
- 개최지
- Texas A&M Hotel