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The electrical and structural properties of HfO2/SrTiO3 stacked gate dielectric with TiN metal gate electrode
- 제목
- The electrical and structural properties of HfO2/SrTiO3 stacked gate dielectric with TiN metal gate electrode
- 저자
- 최창환
- 발행일
- 2011-07-07
- 학회명
- The Third International Conference on Microelectronics and Plasma Technology
- 개최지
- Dalian (대련), China (중국)