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The Schottky Contact Characteristics of Atomic Layer Deposited Ruthenium Silicide with Post Annealing
- 제목
- The Schottky Contact Characteristics of Atomic Layer Deposited Ruthenium Silicide with Post Annealing
- 저자
- 최창환
- 발행일
- 2016-08-25
- 학회명
- 20th Interntional Vacuum Congress (IVC-20)
- 개최지
- Busan, Korea