Expert Opinion on Drug Metabolism and Toxicology

ISSN
P 1742-5255 E 1744-7607
출판사
Ashley Publications Ltd.
국가
ENGLAND
발행 상태
활성

데이터베이스 수록 정보

EMBASE 2016-2020 (5년)
JCR 2008-2019 (12년)
MEDLINE 2016-2021 (6년)
SCIE 2010-2021 (12년)
Scopus 2017-2020 (4년)
SJR 2006-2019 (14년)

전체 49건 중 1번부터 10번까지의 결과를 표시합니다.

2026
Article

Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching

  • Kim, Ju-Ho
  • Jiang, Yi-Lang
  • Jeong, Yeong Jae
  • Kim, Jae-Hwi
  • Chung, Chin-Wook
  • 2026-03
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Transparent electrical-optical probe for noninvasive plasma diagnostics

  • Seo, Beom-Jun
  • Kim, Kyung-Hyun
  • Ahn, Se-hun
  • Kim, Deok-Hwan
  • Jung, Un Jae
  • ... Chung, Chin-Wook
  • 2026-03
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Anomalous electron density of helium, neon, and argon plasmas in high-pressure E-mode inductively coupled plasma

  • 2026-02
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Precise control of low-energy electron beam for selective radical density control

  • 2026-02
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Simultaneous ion and electron beam etching for charge-free and low-damage silicon processing

  • 2026-01
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
2025
Article

The impact of accelerated electrons on electronegativity in an inductively coupled oxygen plasma with a DC-biased grid

  • 2025-12
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Control of photoresist etch rate via a gradient magnetic field in biased inductively coupled plasma

  • 2025-07
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Triple-frequency floating probe method for plasma parameters applicable to processing plasmas

  • Seo, Beom-Jun
  • Lee, Ho-Won
  • Jeon, Sang-Bum
  • Nahm, Hyeon-Ho
  • Chung, Chin-Wook
  • 2025-05
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Charge-free plasma processing using ultra-low electron temperature plasma for atomic-scale semiconductor devices

  • 2025-04
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Control of axial direction electron temperature distribution by gradient DC magnetic field in inductively coupled plasma

  • 2025-03
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
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