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자료 필터
자료유형
발행연도
1995 ~ 2026
1995 2026
키워드
언어
전체 1,062건 중 11번부터 20번까지의 결과를 표시합니다.
2026
Article
Demonstration of 3D-Extendible, Logic-Compatible Sub-1.8 v Asymmetric Double-Gate FeFETs with Sub-3.5 nm Ultrathin HZO for Analog CIM
- Park, Kyungsoo ;
- Jeong, Hyeoncheol ;
- Choi, Jihoon ;
- Kim, Taesuk ;
- Choi, Yeonwoo ;
- ... Ahn, Jinho ;
- ... Choi, Changhwan ;
- 외 3명
- 2026-05
- 2026 IEEE International Memory Workshop, IMW 2026 - Proceedings
- Institute of Electrical and Electronics Engineers Inc.
Article
Enhancing the reliability of actinic mask evaluation through high-frequency signal improvement based on EUV ptychography
- Moon, Seungchan ;
- Hong, Junho ;
- Lee, Taeho ;
- Ahn, Jinho
- 2026-04
- Proceedings of SPIE - The International Society for Optical Engineering
- SPIE
Article
Band Engineering of Gate Interlayer for Low-voltage Operation and Enhanced Reliability in Gate-injection Type FeFETs
- Kim, Hoon ;
- Kim, Giuk ;
- Choi, Hyojun ;
- Joh, Hongrae ;
- Kang, Hyunjun ;
- ... Ahn, Jinho ;
- 외 6명
- 2026-04
- IEEE Electron Device Letters
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Article
Resolution enhancement in EUV ptychography via optimized probe overlap ratio for diffraction diversity
- Hong, Junho ;
- Moon, Seungchan ;
- Lee, Taeho ;
- Ahn, Jinho
- 2026-04
- Proceedings of SPIE - The International Society for Optical Engineering
- SPIE
Article
Interlayer and Band-Engineered Charge Trap Flash Enabling Low Voltage and Reliable Quad Level Operation
- Jeon, Sanghun ;
- Lee, Sangho ;
- Kim, Giuk ;
- Nam, Yunseok ;
- Chang, Seungyeon ;
- ... Ahn, Jinho
- 2026-04
- 2026 International VLSI Symposium on Technology, Systems and Applications, VLSI TSA 2026 - Proceedings of Technical Papers
- Institute of Electrical and Electronics Engineers Inc.
Article
Active phase engineering of extreme ultraviolet masks for mitigating pitch-dependent image split
- Jeong, Dongmin ;
- Lee, Seungho ;
- Lee, Taeho ;
- Ahn, Jinho
- 2026-04
- Journal of Micro/ Nanolithography, MEMS, and MOEMS
- SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
Article
Vapor-phase dry development enabling high-resolution and improved CDU in EUV photoresists
- Seok, Ji-Hoo ;
- Kim, Jiwon ;
- Ji, Hyeonseok ;
- Lee, Jaehyuk ;
- Lee, Taeho ;
- ... Sung, Myung Mo ;
- ... Ahn, Jinho ;
- 외 1명
- 2026-04
- Proceedings of SPIE - The International Society for Optical Engineering
- SPIE
Article
Improving etchability and imaging performance of EUV mask absorber materials via ion implantation (Vol 132, 245, 2026)
- Kim, Yunsoo ;
- Jeong, Dongmin ;
- Lee, Seungho ;
- Kim, Bom-Sok ;
- Kim, Myung-Jin ;
- ... Ahn, Jinho ;
- 외 1명
- 2026-04
- Applied Physics A: Materials Science & Processing
- SPRINGER HEIDELBERG
Article
Vapor-Phase Dry Development of a Nanoscale Zn-Based Metal-Organic Extreme Ultraviolet Photoresist via Surface-Limited β-Diketone Chelation for High-Resolution Patterning
- Seok, Ji-Hoo ;
- Kim, Jiwon ;
- Ji, Hyeonseok ;
- Lee, Jaehyuk ;
- Lee, Taeho ;
- ... Sung, Myung Mo ;
- ... Ahn, Jinho ;
- 외 1명
- 2026-03
- ACS APPLIED NANO MATERIALS
- AMER CHEMICAL SOC
Article
Improving etchability and imaging performance of EUV mask absorber materials via ion implantation
- Kim, Yunsoo ;
- Jeong, Dongmin ;
- Lee, Seungho ;
- Kim, Bom-Sok ;
- Kim, Myung-Jin ;
- ... Ahn, Jinho ;
- 외 1명
- 2026-03
- Applied Physics A: Materials Science & Processing
- SPRINGER HEIDELBERG