정진욱 프로필 사진

정진욱

Chung, Chin Wook

공과대학

전기공학전공

Scopus

연구분야

  • 반도체 및 LCD 공정 장비 제어, 
  • 플라즈마 전자공학

자료 필터

자료유형

발행연도

2002 ~ 2026
2002 2026

키워드

언어

전체 720건 중 21번부터 30번까지의 결과를 표시합니다.

2026
Article

Anomalous electron density of helium, neon, and argon plasmas in high-pressure E-mode inductively coupled plasma

  • 2026-02
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Precise control of low-energy electron beam for selective radical density control

  • 2026-02
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Enhanced anisotropy in advanced semiconductor nanofabrication via ultralow electron temperature plasma for cryogenic etching

  • Kim, Min-Seok ; 
  • Ahn, Jong Ha ; 
  • Kim, Deok Hwan ; 
  • Ha, Seok Hyeon ; 
  • Chung, Chin-Wook
  • 2026-02
  • Materials Science in Semiconductor Processing
  • ELSEVIER SCI LTD
Article

Simultaneous ion and electron beam etching for charge-free and low-damage silicon processing

  • 2026-01
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd
Article

Realizing Vertical Etch Profiles in Fluorine-Rich Ar/CF4 Plasma

  • Park, Junyoung ; 
  • Kim, Nayeon ; 
  • Choi, Jung-Eun ; 
  • Yeo, Yujin ; 
  • Kim, Min-Seok ; 
  • ... Chung, Chin-Wook ; 
  • 외 1명
  • 2026-01
  • Advanced Materials Interfaces
  • WILEY
2025
Article

The impact of accelerated electrons on electronegativity in an inductively coupled oxygen plasma with a DC-biased grid

  • 2025-12
  • Plasma Sources Science and Technology
  • IOP Publishing Ltd