정진욱 프로필 사진

정진욱

Chung, Chin Wook

공과대학

전기공학전공

Scopus

연구분야

  • 반도체 및 LCD 공정 장비 제어
  • 플라즈마 전자공학

자료 필터

자료유형

발행연도

2002 ~ 2026
2002 2026

키워드

언어

전체 718건 중 1번부터 10번까지의 결과를 표시합니다.

2026
Article

Noninvasive method for monitoring plasma parameters and dielectric thickness applicable to plasma processing

  • Seo, Beom-Jun
  • Jung, Jiwon
  • Choi, Jae-Hoon
  • Ahn, Se-Hun
  • Kim, Nayeon
  • ... Chung, Chin-Wook
  • 2026-07
  • Journal of Vacuum Science and Technology A
  • A V S AMER INST PHYSICS
Article

Electron-kinetic reactor engineering for damage-free, high-selectivity plasma etching

  • 2026-04
  • Chemical Engineering Journal
  • ELSEVIER SCIENCE SA
Article

Investigation of the interactions of NF3-based plasma with Y2O3 and YF3 coatings: Focus on contamination particle generation and wall redeposition

  • So, Jongho
  • Jeong, Inseok
  • Maeng, Seonjeong
  • Choi, Eunmi
  • Kim, Minjoong
  • ... Chung, Chin-Wook
  • 외 1명
  • 2026-04
  • Journal of the European Ceramic Society
  • ELSEVIER SCI LTD
1