정진욱 프로필 사진

정진욱

Chung, Chin Wook

공과대학

전기공학전공

Scopus

연구분야

  • 반도체 및 LCD 공정 장비 제어, 
  • 플라즈마 전자공학

자료 필터

자료유형

발행연도

2002 ~ 2026
2002 2026

키워드

언어

전체 722건 중 241번부터 250번까지의 결과를 표시합니다.

2021
Article

Effects of RF bias frequency and power on the plasma parameters and ash rate in a remote plasma source

  • Zhang, Aixian ; 
  • Lee, Moo-Young ; 
  • Lee, Ho-Won ; 
  • Moon, Ho-Jun ; 
  • Chung, Chin-Wook
  • 2021-02
  • Plasma Sources Science and Technology
  • IOP PUBLISHING LTD
Article

Local electron and ion density control using passive resonant coils in inductively coupled plasma

  • Kim, Tae-Woo ; 
  • Lee, Moo-Young ; 
  • Hong, Young-Hun ; 
  • Lee, Moo-Hyun ; 
  • Kim, Ju-Ho ; 
  • ... Chung, Chin-Wook
  • 2021-02
  • Plasma Sources Science and Technology
  • IOP PUBLISHING LTD
2020
Article

The opposite pressure dependence of electron temperature with respect to O-2/Ar mixing ratio in an inductively coupled plasma

  • Lee, Moo-Young ; 
  • Jung, Jiwon ; 
  • Kim, Tae-Woo ; 
  • Kim, Kyung-Hyun ; 
  • Kwon, Deuk-Chul ; 
  • ... Chung, Chin-Wook
  • 2020-11
  • Physics of Plasmas
  • AMER INST PHYSICS
처음 2425